发明名称 Ventilating method and ventilating system for semiconductor manufacturing apparatuses
摘要 A semiconductor manufacturing apparatus ventilating system can reduce energy consumption with respect to air-conditioning and a power spent for transporting air in a clean room by minimizing an amount of circulating air in a clean room. The clean room air, which is supplied to the clean room, is introduced into an air circulating system including the semiconductor manufacturing apparatus. The air circulating system is separated from an atmosphere in the clean room. The clean room air in the air circulating system is circulated within the air circulating system.
申请公布号 US6582296(B2) 申请公布日期 2003.06.24
申请号 US20000873101 申请日期 2000.12.20
申请人 TOKYO ELECTRON LIMITED 发明人 KOMIYAMA KIYOSHI
分类号 H05K7/20;F24F3/16;F24F7/00;H01L21/02;(IPC1-7):F24F3/16 主分类号 H05K7/20
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