发明名称 Semiconductor device and method of forming a semiconductor device
摘要 A semiconductor device includes group III-V layers formed over a substrate. At least one of the group III-V layers is doped with a dopant. The dopant includes a first dopant and one of a second dopant and an isovalent impurity. The first dopant has a covalent radius different in size than the covalent radii of each of the second dopant and the isovalent impurity.
申请公布号 US6583449(B2) 申请公布日期 2003.06.24
申请号 US20010849233 申请日期 2001.05.07
申请人 XEROX CORPORATION 发明人 NORTHRUP JOHN E.;VAN DE WALLE CHRISTIAN G.
分类号 H01L29/20;H01L29/207;H01L33/30;H01L33/32;(IPC1-7):H01L33/00 主分类号 H01L29/20
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