METHOD OF PRODUCTION OF COMPOSITED PARTICLE, COMPOSITED PARTICLE PRODUCED BY THIS METHOD AND AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING CONTAINING THIS COMPOSITED PARTICLE, AND METHOD OF PRODUCTION OF AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING

摘要

The present invention relates to a method for producing a composited particle in which an inorganic particle is not released, a composited particle produced by this method, and an aqueous dispersion for CMP containing this composited particle. The method for producing a composited particle of the present invention comprises forming a preliminary particle by adhering one or more types of inorganic particles on at least a part of the surface area of a polymer particle, then, polycondensing at least one selected from among organosilicon compounds and organometal compounds in the presence of the above-mentioned preliminary particle.