发明名称 |
SEMICONDUCTOR PROCESSING METHODS OF FORMING INTEGRATED CIRCUITRY MEMORY DEVICES, METHODS OF FORMING CAPACITOR CONTAINERS, METHODS OF MAKING ELECTRICAL CONNECTION TO CIRCUIT NODES AND RELATED INTEGRATED CIRCUITRY |
摘要 |
In one aspect, the invention provides a method of forming an integrated circuitry memory device. In one implementation, a conductive layer is formed over both memory array areas and peripheral circuitry areas. A refractory metal layer is formed over the conductive layer to provide conductive structure in both areas. According to one aspect of this implementation, the conductive layer is formed over the memory array provides an electrical contact for a capacitor container to be formed. According to another aspect of this implementation, the conductive layer formed over the peripheral circuitry area constitutes a conductive line which includes at least some of the silicide.
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申请公布号 |
US6583002(B2) |
申请公布日期 |
2003.06.24 |
申请号 |
US20010884950 |
申请日期 |
2001.06.20 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
LANE RICHARD H.;ZAHURAK JOHN K. |
分类号 |
H01L21/8239;H01L21/8242;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8239 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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