发明名称 SUBSTRATE WITH A REDUCED LIGHT-SCATTERING, ULTRAPHOBIC SURFACE AND A METHOD FOR THE PRODUCTION OF THE SAME
摘要 The invention relates to a substrate with a reduced light-scattering, ultraphobic surface, to a method for the production of said substrate and to the use thereof. The substrate with a reduced light-scattering, ultraphobic surface has a total scatter loss <=7%, preferably <=3% and especially <=1% and a contact angle in relation to water of >=140°, preferably >=150°.
申请公布号 IL153101(D0) 申请公布日期 2003.06.24
申请号 IL20010153101 申请日期 2001.05.23
申请人 SUNYX SURFACE NANOTECHNOLOGIES GMBH 发明人
分类号 B32B9/00;B32B17/06;C03C17/38;C03C17/42;C04B41/89;C04B41/90;C23C26/00;(IPC1-7):C03C 主分类号 B32B9/00
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