| 摘要 |
PROBLEM TO BE SOLVED: To perform exposure without, lowering throughput in the case where a substrate is scanned from its periphery toward the center. SOLUTION: Following commencement of relative scanning between a projection region S of an optical system and the substrate W, a pattern image is scanned and exposed on an exposure region A2 on the substrate W after lapse of a given period of time. There are provided a first measuring device for measuring surface positional information of the projection region S and a second measuring device for measuring surface positional information of the exposure region A2 during scanning, in advance of the first measuring device. After commencing relative scanning, the projection region S and the substrate W relatively move a distance L before starting exposure. The second measuring device measures the surface positional information of a position which is distanced from the projection region S by a distance equivalent to or more than the relative movement distance L. COPYRIGHT: (C)2003,JPO |
