| 摘要 |
PROBLEM TO BE SOLVED: To enable the sputtering film deposition on an organic material substrate even in a sputtering apparatus using a passing type substrate holder by efficiently cooling a holder 12 in an in-line vacuum film deposition apparatus which has the passing type substrate holder 12 mechanically separated from a vacuum tank, and moved parallel to the arraying direction of targets 1, 1... provided in the vacuum tank, and deposits a thin film on the substrate 6 held by the holder. SOLUTION: A cold-insulating vessel accommodating heat sink 33 with a cooling material vessel 31 for cold insulation mounted thereon is connected to the holder 12 moving along a passing type substrate holder traveling guide 41 via an electronic refrigeration element 21. The electronic refrigeration element 21 is energized via power supply rails 43P and 43N for the electronic refrigeration element provided parallel to the traveling guide 41, power supply brushes 44P and 44N slidably connected to the rails, and lead wires 22P and 22N. COPYRIGHT: (C)2003,JPO
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