| 摘要 |
PROBLEM TO BE SOLVED: To shorten recovery time of a pH value and reduce usage of pure water, when drain after rinsing treatment is reused for rinsing in substrate development treating equipment. SOLUTION: In the substrate development treating equipment, reused pure water is jetted to a substrate after developing treatment from a rinsing shower nozzle 2 by using a circulating pump 4, thereby rinsing the substrate. A pure water supplying valve 11 is installed in a pure water supplying pipe 7, and a pure water supplying plant 6 is connected with the valve. A pH meter 5 for confirming a pH value of the reused pure water to be supplied to a rinsing shower nozzle 2 is installed in the pipe 7. A drain switching valve 9 for directly discharging a part of drain from a rinsing vessel 1, and returning the residual part to the rinsing tank 3 is installed in a drain pipe 10. Further, a control unit 12 is installed which controls the pure water supplying valve 11 and the drain switching valve 9 on the basis of a signal from the pH meter 5. COPYRIGHT: (C)2003,JPO |
