SUBSTRATE TREATING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treating device that can prevent the adverse effect of a remover upon human body by automatically cleaning a splash precrenting cup. SOLUTION: This substrate treating device is provided with a spin chuck 58 which rotatably holds a substrate W, a first nozzle which supplies the remover to the surface of the substrate W, and a second nozzle which supplies pure water to the surface of the substrate W. This device is also provided with a vertically movable cup 51 and a fixed cup 52 both of which are held by the spin chuck 58 and catch the remover and pure water splashed from the rotating substrate W, and a cleaning fluid discharge nozzle 112 which discharges pure water toward the inner peripheral surfaces of the cups 51 and 52. COPYRIGHT: (C)2003,JPO