| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a polishing pad which has a polishing layer of expanded polyurethane and stable polishing characteristics, and especially a method for producing a polishing pad which does not contains a material to form recessed parts on a polished face, for example, a water-soluble resin fine particle or hollow fine particle, polystyrene foam bead, etc., consequently, has holes composed of polyurethane alone. <P>SOLUTION: This method for producing a polishing pad of expanded polyurethane comprises a stirring process for adding a silicone-based surfactant to an isocyanate-terminated prepolymer and stirring the prepolymer in the presence of a nonreactive gas to give a bubble dispersion, a mixing process for adding a chain extender to the bubble dispersion to give a foam reaction solution, a curing process for reacting and curing the foam reaction solution. The isocyanate monomer content of the isocyanate-terminated prepolymer is ≤20 wt.%. <P>COPYRIGHT: (C)2003,JPO |
