| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently produce a sintered compact target of high density which has reduced occurrence of nodules in a sputtering process where a transparent electrode film is formed while maintaining the high transparency of visible light and high electrical conductivity, and to obtain a target which can suppress the reduction of productivity and the reduction of quality caused by the occurrence of nodules. <P>SOLUTION: In an ITO (compound oxide essentially consisting of indium oxide-tin oxide: In<SB>2</SB>O<SB>3</SB>-SnO<SB>2</SB>) sputtering target obtained by subjecting a powdery mixture in which the mixing ratio x of tin oxide powder satisfies 9.5≤x≤10.5 (wt.%), and the balance indium oxide powder, dissolution residue in the case the target is dissolved with aqua regia, and is filtered with a filter of 0.2 μm thickness is defined as y (wt.ppm), y≤e(2.03x-20.3) is satisfied, then the amount of the occurrence of a modle is reduced. <P>COPYRIGHT: (C)2003,JPO |
