| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition having high resolving power and excellent in defocus latitude and profile. <P>SOLUTION: In the positive photosensitive composition comprising (A) a compound that generates an acid upon irradiation with an active ray or radiation and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, (A) the compound that generates an acid upon irradiation with an active ray or radiation is a compound having a phenacylsulfonium salt structure or a sulfonium salt not having an aromatic cyclic structure and its anionic moiety is an anion of an aromatic sulfonic acid substituted by at least one fluorine atom and/or a group having at least one fluorine atom. <P>COPYRIGHT: (C)2003,JPO |
