| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure system of high position measurement precision of an original edition stage and a substrate stage by restraining refractive index fluctuation of a laser light. SOLUTION: The exposure system is equipped with a chamber 1 surrounding a space of a wafer stage 2 and a space of a reticle stage 4, a high purity nitrogen supply line 14 for supplying high purity nitrogen gas to a space surrounded by the chamber 1, supply systems 15, 16 and 17, control valves 23, 24 and 25, a drain port 9 as a circulating means for absorbing gas in the space surrounded by the chamber 1 and again supplying the gas to the space after cleaning, a circulating unit 10, a filter box 11, a filter box 12, a circulating line 13, a control valve 27, an oxygen supply line for supplying oxygen to the space which contains the circulating means and is surrounded by the chamber 1, and a mass flow controller 22. Oxygen concentration of the space surrounded by the chamber 1 is controlled to be in a desired range. COPYRIGHT: (C)2003,JPO
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