发明名称 MANUFACTURING METHOD FOR MAGNETOOPTIC DISK BY INDUCTIVELY COUPLED RF PLASMA SUPPORTED MAGNETRON SPUTTERING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a magnetooptic disk which can form a magnetooptic recording film of small particle size enough for good magnetic field sensitivity and high-density recording by using an inductively coupled RF plasma supported magnetron sputtering device. SOLUTION: The inductively coupled RF plasma supported magnetron sputtering device which has a magnetic circuit 10 provided on the reverse surface of at least one cathode electrode 9, a target 12 mounted on the top surface of each cathode electrode 9, and a helical coil 14 provided so as to surround the space between the target 12 and a substrate 7 and can superposes RF electric power on the coil 14 is used to form the magnetooptic recording film on the substrate 7. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003173588(A) 申请公布日期 2003.06.20
申请号 JP20010371128 申请日期 2001.12.05
申请人 ULVAC JAPAN LTD 发明人 OTA ATSUSHI;MORINAKA TAIZO;TANI NORIAKI;KAWAMURA HIROAKI;ISHIBASHI AKIRA;MIURA TOMOHITO
分类号 C23C14/34;G11B11/105;(IPC1-7):G11B11/105 主分类号 C23C14/34
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