发明名称 |
MANUFACTURING METHOD FOR MAGNETOOPTIC DISK BY INDUCTIVELY COUPLED RF PLASMA SUPPORTED MAGNETRON SPUTTERING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a magnetooptic disk which can form a magnetooptic recording film of small particle size enough for good magnetic field sensitivity and high-density recording by using an inductively coupled RF plasma supported magnetron sputtering device. SOLUTION: The inductively coupled RF plasma supported magnetron sputtering device which has a magnetic circuit 10 provided on the reverse surface of at least one cathode electrode 9, a target 12 mounted on the top surface of each cathode electrode 9, and a helical coil 14 provided so as to surround the space between the target 12 and a substrate 7 and can superposes RF electric power on the coil 14 is used to form the magnetooptic recording film on the substrate 7. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003173588(A) |
申请公布日期 |
2003.06.20 |
申请号 |
JP20010371128 |
申请日期 |
2001.12.05 |
申请人 |
ULVAC JAPAN LTD |
发明人 |
OTA ATSUSHI;MORINAKA TAIZO;TANI NORIAKI;KAWAMURA HIROAKI;ISHIBASHI AKIRA;MIURA TOMOHITO |
分类号 |
C23C14/34;G11B11/105;(IPC1-7):G11B11/105 |
主分类号 |
C23C14/34 |
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