METHOD OF MANUFACTURING CAPACITANCE ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method of stably manufacturing a ferroelectric capacitance element in which a coverage defect is not generated when a contact hole is formed. SOLUTION: The method of manufacturing the capacitance element comprises a process in which an insulating layer 7 is formed on a support substrate 1 so as to cover the capacitance element constituted of a lower electrode 3, a capacitance insulating layer 4 and an upper electrode 5 formed on the support substrate 1 and a process in which a photoresist mask 9 having an opening 8 is formed on the insulating layer 7 and in which the opening 8 in the photoresist mask 9 is worked to be a shape having a taper angle 12 by dry- etching the photoresist mask 9. COPYRIGHT: (C)2003,JPO