| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a new sulfonium salt, and a chemically amplified positive- type resist composition containing the sulfonium salt and a resin component, suitable for excimer laser lithography and having excellent resolution and profile. <P>SOLUTION: The new sulfonium salt is expressed by formula (1) (R<SP>1</SP>, R<SP>2</SP>and R<SP>3</SP>are each independently H, OH, a halogen, a 1-6C alkyl or a 1-6C alkoxy; and Q is an alicyclic hydrocarbon group substituted with at least one fluorine atom). The chemically amplified positive-type resist composition contains the compound of formula (1) in combination with a resin containing a polymer unit having a group unstable to acids, insoluble or scarcely soluble in an alkali and changed to be soluble in an alkali by the action of an acid. <P>COPYRIGHT: (C)2003,JPO |
