发明名称 |
METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT AND NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a nitride semiconductor light emitting element capable of sufficiently activating an impurity in a nitride semiconductor layer even by a heat treatment at a low temperature. SOLUTION: The method for manufacturing the nitride semiconductor light emitting element comprises the step of forming a p-type AlGaN clad layer 7 and a p-type GaN contact layer 8 on an MQW light emitting layer 6, the step of forming a Pd electrode layer 9 on the layer 7 and the layer 8, and the step of thereafter activating the impurity in the layer 7 and the layer 8 by heat treating at about 300°C. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003174237(A) |
申请公布日期 |
2003.06.20 |
申请号 |
JP20010374299 |
申请日期 |
2001.12.07 |
申请人 |
SANYO ELECTRIC CO LTD |
发明人 |
YAMAGUCHI TSUTOMU;NOMURA YASUHIKO;TODA TADAO |
分类号 |
H01L21/28;H01S5/323;H01S5/343;(IPC1-7):H01S5/343 |
主分类号 |
H01L21/28 |
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