A PHOTOELECTRON EMISSION MICROSCOPE FOR WAFER AND RETICLE INSPECTION

摘要

A method of inspecting and imaging substrates with an electron beam. The method can include a illuminating the substrate with a photon beam to cause photoemission of electrons. A low energy electron beam can be used to prevent of reduce positive charging of the subsrate. Reflected electrons and/or emitted photoelectrons can be imaged to review or inspect the substrate.