发明名称 |
DROP DISCHARGE HEAD AND METHOD OF PRODUCING THE SAME |
摘要 |
A method of producing a drop discharge head comprising the steps of; providing a silicon substrate; forming a channel-forming element from the silicon substrate having a pressure chamber for containing a fluid to be pressurized, and a nozzle-communicating channel for conducting the pressurized fluid to a nozzle, wherein the nozzle-communicating channel is formed by anisotropic etching of the silicon substrate after forming a non-through hole by dry etching of the silicon substrate.
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申请公布号 |
WO03049951(A1) |
申请公布日期 |
2003.06.19 |
申请号 |
WO2002JP12790 |
申请日期 |
2002.12.05 |
申请人 |
RICOH COMPANY, LTD.;KINPARA, SHIGERU |
发明人 |
KINPARA, SHIGERU |
分类号 |
B41J2/14;B41J2/16;(IPC1-7):B41J2/045;B41J2/055 |
主分类号 |
B41J2/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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