发明名称 Method of bonding and transferring a material to form a semiconductor device
摘要 A donor substrate (12) which is patterned to include a donor mesa (18) is bonded to a receiving substrate (20). In a one embodiment, a bulk portion of the donor substrate is removed while leaving a transferred layer (26) bonded to the receiving substrate. The transferred layer is a layer of material transferred from the donor mesa. A portion of receiving substrate can be processed to form a recess (27, 28, or 32) to receive the donor mesa. Alternatively, the transferred layer can be formed over a dummy feature (46) formed on the receiving substrate, either with or without the use of mesas on the donor substrate. In a preferred embodiment, the transferred layer is used to form an optical device such as a photodetector in a semiconductor device. With the invention, bonding can be achieve despite having a non-planar surface on the receiving substrate.
申请公布号 US2003114001(A1) 申请公布日期 2003.06.19
申请号 US20010022711 申请日期 2001.12.17
申请人 JONES ROBERT E.;CSUTAK SEBASTIAN 发明人 JONES ROBERT E.;CSUTAK SEBASTIAN
分类号 H01L23/538;H01L21/20;H01L21/762;(IPC1-7):H01L21/302;H01L21/461 主分类号 H01L23/538
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