| 发明名称 |
COMPOSITIONS FOR CLEANING ORGANIC AND PLASMA ETCHED RESIDUES FOR SEMICONDUCTOR DEVICES |
| 摘要 |
A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.
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| 申请公布号 |
WO0204233(A8) |
申请公布日期 |
2003.06.19 |
| 申请号 |
WO2001US21713 |
申请日期 |
2001.07.10 |
| 申请人 |
EKC TECHNOLOGY, INC. |
发明人 |
SMALL, ROBERT, J.;PATEL, BAKUL, P.;LEE, WAI MUN;HOLMES, DOUGLAS;DAVIOT, JEROME;REID, CHRISTOPHER |
| 分类号 |
C09K13/08;G03F7/42;H01L21/02;H01L21/027;H01L21/304;H01L21/306;H01L21/308;H01L21/311;(IPC1-7):B44C1/22;C09K13/00;H01L21/00 |
主分类号 |
C09K13/08 |
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