发明名称 |
Coating method and apparatus |
摘要 |
A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing solution is fed from a processing-solution supply source at a specific pressure via a processing-solution pressure-up feeder. The pressure of the processing solution fed via the processing-solution pressure-up feeder is adjust to another specific pressure or more at least when the processing-solution suppliers are operating simultaneously. A flow-rate detector detects the flow rate of the processing solution supplied from each processing-solution supplier. A pressure detector detects the pressure of the processing solution fed via the processing-solution pressure-up feeder. The flow-rate adjuster and the pressure adjuster are controlled based on prestored control data and detection signals from the flow-rate detector and the pressure detector so that the same amount of processing solution is supplied to the targets from the processing-solution suppliers.
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申请公布号 |
US2003113440(A1) |
申请公布日期 |
2003.06.19 |
申请号 |
US20020271795 |
申请日期 |
2002.10.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HAYASHI SHINICHI;OOKUMA HIROFUMI;SUEFUJI KOUICHI |
分类号 |
H01L21/00;(IPC1-7):B05D1/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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