| 摘要 |
<p>The gas mixture comprises at least a main constituent to be produced and impurities to be separated from said mixture. The treatment method consists in using at least two adsorbers which follow in offset manner a common cycle during which there are successively an adsorption phase and a regeneration phase using a regenerating gas. Furthermore, it consists in subjecting at the beginning of the adsorption phase (steps I or IV) and/or at the beginning of the use of regenerating gas (step VI), to only part of the gas mixture flow to be treated, respectively the regenerating gas flow, until said adsorber is saturated, respectively substantially discharged, in at least one of the main constituents to be produced, while maintaining at least another adsorber in adsorption phase. The invention is useful for treating a mixture rich in carbon monoxide and hydrogen.</p> |
