发明名称 Method of manufacturing an optical core
摘要 Embodiments of the present invention provide a highly uniform low cost production worthy solution for manufacturing low propagation loss optical waveguides on a substrate. The method comprises depositing an optical core using a high-density plasma deposition process. The method is particularly advantageous in forming high contrast refractive index optical cores, such as SiOxNy, with drastically reduced propagation loss. In one embodiment the high-density plasma deposition process is an HDP-CVD process. In another embodiment the high-density plasma deposition process is an HDP-ECR process. In one embodiment, a method of forming an optical waveguide comprises forming at least one optical core on an undercladding layer of a substrate using a high-density plasma deposition process.
申请公布号 US2003110808(A1) 申请公布日期 2003.06.19
申请号 US20010020461 申请日期 2001.12.14
申请人 APPLIED MATERIALS INC., A DELAWARE CORPORATION 发明人 M'SAAD HICHEM;WANG ANCHUAN
分类号 C03C17/02;C23C16/30;G02B6/12;G02B6/132;G02B6/136;(IPC1-7):C03B37/07 主分类号 C03C17/02
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