发明名称 |
Method of manufacturing an optical core |
摘要 |
Embodiments of the present invention provide a highly uniform low cost production worthy solution for manufacturing low propagation loss optical waveguides on a substrate. The method comprises depositing an optical core using a high-density plasma deposition process. The method is particularly advantageous in forming high contrast refractive index optical cores, such as SiOxNy, with drastically reduced propagation loss. In one embodiment the high-density plasma deposition process is an HDP-CVD process. In another embodiment the high-density plasma deposition process is an HDP-ECR process. In one embodiment, a method of forming an optical waveguide comprises forming at least one optical core on an undercladding layer of a substrate using a high-density plasma deposition process.
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申请公布号 |
US2003110808(A1) |
申请公布日期 |
2003.06.19 |
申请号 |
US20010020461 |
申请日期 |
2001.12.14 |
申请人 |
APPLIED MATERIALS INC., A DELAWARE CORPORATION |
发明人 |
M'SAAD HICHEM;WANG ANCHUAN |
分类号 |
C03C17/02;C23C16/30;G02B6/12;G02B6/132;G02B6/136;(IPC1-7):C03B37/07 |
主分类号 |
C03C17/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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