| 摘要 |
PURPOSE: A semiconductor fabrication apparatus is provided to perform a deposition process and an etching process by using an ATM transfer robot and a vacuum transfer robot. CONSTITUTION: A semiconductor fabrication apparatus includes a plurality of load lock chambers(2,3), a plurality of vacuum transfer chambers(4,5), a plurality of vacuum transfer robots(6,7), and a plurality of process chambers(8,9) having two stations. The load lock chambers include two stages of a loading stage and an unloading stage. Each number of the load lock chambers, the vacuum transfer chambers, and the vacuum transfer robots is equal to the number of the process chambers having two stages. A plurality of spindle assemblies(14,15) having two rotary shafts are used for forming the process chambers having two stations.
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