| 摘要 |
PURPOSE: Provided are novel topically applicable cosmetic or dermatological sunscreen compositions well suited for the UV-photoprotection of human skin and/or hair. CONSTITUTION: A topically applicable cosmetic/dermatological sunscreen composition suited for the UV-photoprotection of human skin and/or hair, comprises synergistically UV-APPD-enhancing amounts of (i) at least one UV-screening silicon compound having a benzotriazole functional group substituent, (ii) at least one UV-screening dibenzoylmethane compound, and (iii) at least one UV-screening amino-substituted 2-hydroxybenzophenone compound having the following structural formula (III) in which R1 and R2, which may be identical or different, are each a hydrogen atom, a C1-C20 alkyl radical, a C2-C10 alkenyl radical, a C3-C10 cycloalkyl radical or a C3-C10 cycloalkenyl radical, with the proviso that R1 and R2 can together form, with the nitrogen atom to which they are bonded, a 5- or 6-membered heterocyclic ring member; R3 and R4, which may be identical or different, are each a C1-C20 alkyl radical, a C2-C10 alkenyl radical, a C3-C10 cycloalkyl radical, a C3-C10 cycloalkenyl radical, a C1-C12 alkoxy radical, a (C1-C20)alkoxycarbonyl radical, a C1-C12 alkylamino radical, a di(C1-C12)alkylamino radical, an aryl radical or a heteroaryl radical which is optionally substituted, or a water-solubilizing substituent selected from among a carboxylate group, a sulfonate group or an ammonium residue; X' is a hydrogen atom or a -COOR5 or -CONRR7 radical; R5, R6 and R7, which may be identical or different, are each a hydrogen atom, a C1-C20 alkyl radical, a C2-C10 alkenyl radical, a C3-C10 cycloalkyl radical, a C3-C10 cycloalkenyl radical, a -(Y'O)o-Z' radical or an aryl radical; Y' is -(CH2)2-, -(CH2)3-, -(CH2)4- or -CH-(CH3)-CH2-; Z' is -CH2-CH3, -CH2CH2CH3, -CH2-CH2-CH2-CH3 or -CH(CH3)-CH3; m' is an integer ranging from 0 to 3; n' is an integer ranging from 0 to 3; and o is an integer ranging from 1 to 2.
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