| 摘要 |
PURPOSE: A peak type defect standard sample is provided to be capable of improving the accuracy of particle counting by removing obstruction factors due to the height and interval of defective structures through the improvement of the structure of the sample. CONSTITUTION: A film is formed on a substrate, wherein the film includes a plurality of protrusions for measuring defects using the light reflected from the protrusions. Preferably, the protrusions have the same height(H), respectively. Preferably, the protrusions have different surfaces(S1,S2,S3,S4), respectively. Preferably, the protrusions are differently spaced apart from each other, so that the intervals(L1,L2,L3) between protrusions are different. Preferably, a plurality of alignment points(25,26) are formed at the peripheral portion of the film.
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