ELECTROSTATIC CHUCK OF ION IMPLANTER

摘要

PURPOSE: An electrostatic chuck of an ion implanter is provided to be capable of semipermanently connecting between a platen and a base and easily replacing with each other by using a mechanical connecting part. CONSTITUTION: A wafer is fixed by an electrostatic chuck(200) in an ion implanter under an ion implanting process. The electrostatic chuck(200) is provided with a base(210), a platen(230) installed on the base(210) for fixedly loading the wafer, and a mechanical connecting part(220) for mechanically fixing the platen(230) on the base(210). The mechanical connecting part further includes a fixing part(222) located at the edge portion of the platen(230) and a connecting bolt(224) for fixing between the fixing part(222) and the base(210). Preferably, a plurality of platens(230) are used.