| 摘要 |
PURPOSE: A hillock-free aluminum line layer and a manufacturing method thereof are provided to be capable of reducing fabrication cost, layer thickness or line width, and manufacturing time. CONSTITUTION: A hillock-free aluminum line layer is formed at the upper portion of a substrate(302). At this time, the hillock-free aluminum line layer is made of at least two pure aluminum layers. The first pure aluminum layer containing a plurality of the first aluminum crystal grains(304), is formed at the upper portion of the substrate. The second pure aluminum layer containing a plurality of the second aluminum crystal grains(306), is formed at the upper portion of the first pure aluminum layer. At this time, the second aluminum crystal grain is larger than the first aluminum crystal grain. At the time, the second aluminum crystal grain has a higher density than that of the first aluminum crystal grain. |
