发明名称 METHOD AND APPARATUS FOR EXPOSURE
摘要 PURPOSE: To provide a method and apparatus for exposure which facilitates replacement of reticle or temperature control. CONSTITUTION: A vacuum reticle library 64 is provided with a plurality of steps 68 for mounting conveyed reticles, respectively. A channel 68a is formed in each of the steps 68. Temperature of each reticle on the step 68 can be controlled by flowing temperature-controlled water through the channel 68a in the step 68. An atmospheric reticle library 66 is provided with a plurality of steps 69. A reticle case 67 is mounted on each of the steps 69. The individual reticle cases 67 and the individual reticles are provided with bar codes 70, respectively. When the reticles are conveyed, the bar codes 70 thereon are each scanned for identification.
申请公布号 KR20030047792(A) 申请公布日期 2003.06.18
申请号 KR20020077232 申请日期 2002.12.06
申请人 NIKON CORPORATION 发明人 HIRAYANAKI NORIYUKI
分类号 G03F7/20;H01J37/16;H01J37/305;H01L21/027;H01L21/677 主分类号 G03F7/20
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