METHOD FOR FABRICATING MIRROR

摘要

PURPOSE: A method for fabricating a mirror is provided to improve the surface roughness of a mirror side and enhance the reflexibility of the mirror side by performing an additional reflow process such as PSG(Phosphor-Silicate Glass) or BPSG(Boron Phosphorous Silicate Glass). CONSTITUTION: A structure(12) of Si is patterned on a wafer(11). The structure of Si is etched. A thin film(15) having an excellent reflow characteristic is deposited on the etched vertical side of the structure. A reflow process is performed on the deposited side. A mirror film(14) is deposited thereon. The wafer is formed with an SOI(Silicon On Insulator). In addition, the wafer is formed with an SOG(Silicon On Glass). The thin film having the excellent reflow characteristic is formed with a PSG. In addition, the thin film having the excellent reflow characteristic is formed with a BPSG.