LIFT UNIT OF CVD APPARATUS

摘要

PURPOSE: A lift unit of a CVD(Chemical Vapor Deposition) apparatus is provided to prevent a bending phenomenon of a heating line due to a narrow interval between a panel and a lift shaft by forming a groove at a lower end portion of the lift shaft. CONSTITUTION: A lift unit is located within a process chamber(310) of a CVD apparatus(300) which is installed in the inside of a panel(400). The lift unit elevates a susceptor(320) including a heater(330). A lift shaft(340) is connected to the susceptor in order to be moved between the outside and the inside of the process chamber. A bellows(350) is installed to surround the lift shaft. The bellows is used for buffering a shock when the susceptor is elevated. A heating line(360) is connected to the heater of the susceptor through the outside of the panel and the inside of the lift shaft. A groove(370) is formed at a lower end portion of the lift shaft in order to prevent the interference between the lift shaft and the heating line when the lift shaft is elevated.