| 发明名称 |
A litographic apparatus and a device manufacturing method |
| 摘要 |
A lithographic projection apparatus in which movement of a substrate table in a plane is accomplished by means of a planar magnetic positioning means (PW) and has a mechanical limiter (100) for limiting rotation of the substrate table about a direction orthogonal to the plane. <IMAGE>
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| 申请公布号 |
EP1319986(A1) |
申请公布日期 |
2003.06.18 |
| 申请号 |
EP20020258474 |
申请日期 |
2002.12.09 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JACOBS, HERNES;VAN DER SCHOOT, HARMEN KLAAS;VOSTERS, PETRUS MATTHIJS HENRICUS;DE GROOT, TON |
| 分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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