发明名称 MANUFACTURING METHOD OF OPTIC MICRO STRUCTURES ARRAY DIE
摘要 PURPOSE: A manufacturing method of optic micro structures array die with a certain structure installed is provided which improves the defects of the conventional mechanical cutting method and LIGA(in German, Lithographie, Galvanoformung, Abformung) process. CONSTITUTION: The manufacturing method of the optic micro structures array die with a certain structure installed is as follows: performing a first exposure to PMMA(PolyMethylMethacrylAte)(2) as a sensitive material using x-ray(7) and x-ray mask(6) of a radiation accelerator and developing it, thereby preparing firstly a desired optic micro structures array. By aligning another x-ray mask to the array, performing the second exposure to a desired part(10) of the structures. At that time, the molecular weight of the sensitive material of the part exposed to x-ray decreases and so that Tg thereof decreases. Heat treating and so that the part having the decreased Tg is melted at a lower temperature than the unexposed part to generate a reflow, thereby preparing the certain structure such as micro-lens pattern. And then forming the nickel die frame and performing a hot embossing process.
申请公布号 KR20030047053(A) 申请公布日期 2003.06.18
申请号 KR20010077428 申请日期 2001.12.07
申请人 POSTECH FOUNDATION 发明人 LEE, SEONG GEUN;LEE, SEUNG SEOP
分类号 B29D11/00;(IPC1-7):B29D11/00 主分类号 B29D11/00
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