发明名称 Method of cleaning of harmful gas and cleaning apparatus
摘要 Disclosed is a method for cleaning of the harmful gas, the method comprising mixing harmful gas, discharged from reaction processes using organic metal compounds as the reaction raw materials, with oxygen or air and thereafter bringing the mixture into contact with a catalyst obtained by carrying a noble metal on an inorganic support, a catalyst comprising at least one metal oxide selected from vanadium oxide, chromium oxide, manganese oxide, iron oxide, copper oxide, silver oxide, cobalt oxide and nickel oxide or a catalyst obtained by carrying the metal oxide on an inorganic support, at temperatures between 100° C. and 800° C. to clean the harmful gas. Disclosed also is an apparatus used in the method. The invention ensures that harmful components can be purified in an efficient manner without discharging organic compounds and a large amount of carbon dioxide after the harmful gas is purified, requiring no aftertreatment.
申请公布号 US6579509(B1) 申请公布日期 2003.06.17
申请号 US20000716401 申请日期 2000.11.21
申请人 JAPAN PIONICS CO., LTD. 发明人 OTSUKA KENJI;MURANAGA NAOKI;ARAKAWA SATOSHI;IKEDA TOMOHISA
分类号 B01D53/86;(IPC1-7):A62D3/00 主分类号 B01D53/86
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