| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve working precision without deforming a lower surface plate. <P>SOLUTION: This duplex polishing device 1 which polish both surfaces of a work 3 by rotating the work in a state of holding it between an upper surface plate 4 and the lower surface plate 5 with pressure is made its upper surface of a lower surface plate receiver part 5 to support the lower surface plate 5 in a flat plate shape. <P>COPYRIGHT: (C)2003,JPO |
