发明名称 APPARATUS FOR FORMING COATING FILM AND METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To effectively utilize a substrate by approaching a zone to be coated to the periphery of the substrate in the formation of a liquid film while scanning linearly. <P>SOLUTION: The delivery of the substrate to a substrate holding part is performed by using a substrate transporting means having a function to align and delivering the pre-treated substrate to the substrate holding part in a coating unit. After the delivery, the precise position of the substrate is recognized by a position detecting means and the central coordinates of the substrate are obtained. The error in each center of the substrate and the substrate holding part is corrected if it is present and after the precise positioning of the zone of the substrate is recognized in a control part, the coating liquid is supplied to the zone. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003170105(A) 申请公布日期 2003.06.17
申请号 JP20010370266 申请日期 2001.12.04
申请人 TOKYO ELECTRON LTD 发明人 KITANO TAKAHIRO;ISHIZAKA NOBUKAZU;KOGA NORIHISA;ONO SHUJI
分类号 G03F7/16;B05C11/08;B05D1/40;H01L21/027;H01L21/68 主分类号 G03F7/16
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