发明名称 Semiconductor wafer with crystal lattice defects, and process for producing this semiconductor wafer
摘要 A semiconductor wafer has a front side 1, a back side 2, a top layer 3, a bottom layer 4, an upper inner layer 5 lying below the top layer 3, a lower inner layer 6 lying above the bottom layer 4, a central region 7 between the layers 5 and 6 an uneven distribution of crystal lattice defects. The concentration of the defects exhibits a first maximum (max1) in the central region 7 and a second maximum (max2) in the bottom layer 4.
申请公布号 US6579589(B1) 申请公布日期 2003.06.17
申请号 US20000575012 申请日期 2000.05.19
申请人 WACKERSILTRONIC GESELLSCHAFT FUR HALBLEITERMATERIALIEN AG 发明人 OBERMEIER GUENTHER;WAHLICH REINHOLD;BAUER THERESIA;BUCHNER ALFRED
分类号 C30B29/06;H01L21/26;H01L21/322;(IPC1-7):C30B29/06 主分类号 C30B29/06
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