| 摘要 |
There is provided a control apparatus for a light radiation-type rapid heating and processing device in which a power factor can be improved, the influence of a higher harmonics strain can be eliminated and a rapid temperature increase of a heated substrate can be performed without any delay in control. Lamps are arranged within a lamp chamber of the light radiation-type rapid heating and processing device, and the workpiece heated and processed is arranged in a processing chamber. The region where the lamps are arranged is divided into a plurality of zones corresponding to a distance from the center of the region, and at least one lamp is arranged in each of the zones. A power control unit is provided for each of the zones. The control parts generate a PWM signal in response to a control pattern stored in advance and send it to each of the power control units. The power control units are provided with a switching element which is turned ON/OFF by the PWM signal and control the power supplied to the lamp belonging to each of the zones.
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