发明名称 Method for growing a compound semiconductor, quantum well structure using the same, and compound semiconductor device including the same
摘要 A method for growing a compound semiconductor includes a first formation step of forming a first group III-V compound layer; a second formation step of forming a second group III-V compound layer including nitrogen and at least one group V element other than nitrogen as a group V composition; and a third formation step of forming a third group III-V compound layer between the first group III-V compound layer and the second group III-V compound layer, the third group III-V compound layer being formed for controlling a reactivity of the second group III-V compound layer with a nitrogen source used in the second formation step.
申请公布号 US6579780(B2) 申请公布日期 2003.06.17
申请号 US20000746930 申请日期 2000.12.26
申请人 SHARP KABUSHIKI KAISHA 发明人 TAKAHASHI KOJI
分类号 C30B29/40;C30B25/02;H01L21/203;H01L21/205;H01L29/12;H01L33/06;H01L33/32;H01S5/343;(IPC1-7):H01L21/20 主分类号 C30B29/40
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