| 摘要 |
An inspection apparatus in which the environment for inspecting a semiconductor wafer or the like at a high degree of cleanness to enable a fine pattern to be inspected properly. A main body portion 10 for inspecting the semiconductor wafer or the like is housed in the inside of a clean box 3 and clean air is supplied from the clean air unit 4 into the inside of the clean box 3 in which the main body portion 10 is accommodated. There are provided opening areas 80 in lateral sides of the clean box 3 lying laterally of the inspection stage 14 for the main body portion 10 and the vessel mounting space 8. The clean air supplied from the clean air unit 4 into the inside of the clean box is passed over the inspection stage carrying the semiconductor wafer and through the cassette 7b mounted in the vessel mounting space 8 so as to be discharged from the opening areas 80 to outside of the clean box 3. This effectively prohibits contaminants produced in the clean box 3 from being affixed to the semiconductor wafer mounted on the inspection stage 14 or to the semiconductor wafer loaded in the cassette 7b.
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