发明名称 High frequency semiconductor device
摘要 A high frequency semiconductor device includes semiconductor elements provided on a semiconductor substrate, a surface insulating layer for covering the semiconductor elements, at least one wiring layer which is provided above the surface insulating layer, with at least one insulating interlayer provided therebetween, and which combines with the ground potential to form transmission line, and at least one heat-radiating stud which is provided in at least one throughhole so as to penetrate said insulating interlayers and so as not to penetrate said surface insulating layer.
申请公布号 US6580166(B2) 申请公布日期 2003.06.17
申请号 US20020078450 申请日期 2002.02.21
申请人 FUJITSU QUANTUM DEVICES LIMITED 发明人 BABA OSAMU;MIMINO YUTAKA;AOKI YOSHIO;GOTOH MUNEHARU
分类号 H01L23/52;H01L21/3205;H01L21/822;H01L23/34;H01L23/367;H01L23/66;H01L27/04;H01P3/08;(IPC1-7):H01L23/10 主分类号 H01L23/52
代理机构 代理人
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