METHOD OF MANUFACTURING INCLINED DIFFUSE REFLECTION BODY AND STRUCTURE

摘要

PROBLEM TO BE SOLVED: To suggest a new manufacturing process for an inclined diffuse reflection body and to propose a structure.

SOLUTION: Optical masks including a plurality of half tone exposure units 72 are used. A half tone photolithography process is performed for a positive light resist formed on a substrate. Only one exposure process and an appropriate drying step are enough for forming a plurality of inclined faces 84 and forming coarse astigmatism on the inclined faces 84. The sizes of a half tone exposure units 72 are selected at random. Each of the half tone exposure units 72 includes a plurality of parallel transmissive strips or shadow strips 74. The pitch of the transmissive strips or shadow strips 74 in a single half tone exposure unit 72 is arbitrary. The width of the shadow strips 74 gradually varies from one side of the half tone exposure units 72 to the other side.

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