发明名称 EQUIPMENT FOR REGENERATING USED RESIST PEELING SOLUTION AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide an equipment for regenerating a used resist peeling solution capable of sufficiently reducing the amounts of an alkanolamine and an organic solvent supplied in regeneration of a used resist peeling solution and to provide a method therefor. SOLUTION: The equipment for regenerating used resist peeling solution in which a used resist peeling solution is regenerated to obtain a regenerated resist peeling solution, has a membrane separator 7 having a membrane whose molecular cutoff is 100-1,500, wherein the used resist peeling solution is separated by the use of the membrane into a concentrated solution and a permeated solution, an adjustment tank 17 in which the permeated solution is stored and the concentrations of an alkanolamine and an organic solvent are adjusted, a means 18 for supplying a fresh alkanolamine to the adjustment tank 17, and a means 22 for supplying a fresh organic solvent to the adjustment tank 17. Since a resist in the used resist peeling solution cannot permeate the membrane and the concentration of the resist in the permeated solution is sufficiently low, the necessity of diluting the resist in the permeated solution becomes low and the amounts of the alkanolamine and the organic solvent supplied to the adjustment tank 17 can be sufficiently reduced. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003167358(A) 申请公布日期 2003.06.13
申请号 JP20010365033 申请日期 2001.11.29
申请人 NAGASE & CO LTD;ABCOR JAPAN CO LTD;NAGASE CMS TECHNOLOGY CO LTD 发明人 OGAWA OSAMU;KOBAYAKAWA YASUYUKI;KITAGAWA YOSHIYA;KIKUKAWA MAKOTO;KANEYASU TAKAYUKI
分类号 B01D61/14;G03F7/42;H01L21/027;(IPC1-7):G03F7/42 主分类号 B01D61/14
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