| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry process spacer scattering device by which uneven distribution of spacers in a scattering area caused by movement of the uniformly scattered spacers in accordance with the movement of an electric charge can be prevented. SOLUTION: In the dry process spacer scattering device having a table 4 for placing a transparent substrate 3 disposed in a chamber 1 provided with a spacer scattering nozzle 2 and a plurality of substrate pushing-up members 6 which are loosely inserted through a plurality of passage holes 7 formed in the table 4 and can be upwardly and downwardly moved by a driving device 5, the parts of the substrate pushing-up members 6 coming in contact with the transparent substrate 3 are subjected to insulation treatment. COPYRIGHT: (C)2003,JPO
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