| 摘要 |
PROBLEM TO BE SOLVED: To provide a sweep exposure device which has a simple configuration, uniformizes a sweep speed of light on a photosensitive material, scanned by turning a turning mirror, and prevents unevenness in density. SOLUTION: When exposing light emitted from a light source to a photosensitive material via a turning mirror, a lever attached to a shaft of the turning mirror is moved within a turning surface of the turning mirror by a driving means which moves linearly. The turning mirror is turned and speed an exposure surface of the photosensitive material is swept and exposed with the light at approximately uniform. An electric slider using a ball screw is used suitably for the driving means which moves linearly. COPYRIGHT: (C)2003,JPO
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