| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus for forming a film on a substrate surface, whick resolves lowering of the substrate quality and the yield resulting from exfoliation of a material formed on a mask or the like during film-forming on the substrate, and to provide a film-forming method using the film-forming device. SOLUTION: The film-forming apparatus which is provided with a substrate attaching frame for mounting the substrate and the mask, a means for transporting the substrate attaching frame, and a film-forming mechanism for forming the film on the surface of the substrate from the mask side through an opening of the mask, is characterized by having a film-formation-inhibiting part with a gap of 1 mm or less from the surface of the mask, in a perimeter on the opposite surface of the above mask to the substrate. COPYRIGHT: (C)2003,JPO
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