发明名称 PHOTOETCHING METHOD FOR ELECTRONIC PARTS WITH METALLIC LAYER DISPOSED ON ONE FACE THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing electronic parts with a metallic layer disposed on one face thereof by which such electronic parts can be manufactured with at least increased productivity of coating with a liquid photoresist without forming a photoresist layer on a face opposite to a metallic layer face even in the case of dip coating with the liquid photoresist when electronic parts are manufactured by photoetching using substrates with a metallic layer disposed on one face of a support. <P>SOLUTION: Two substrates 11, 12 are disposed in such a way that the support 31, 32 faces thereof opposite to the metallic layer faces thereof confront each other, the tops of the metallic layers 21, 22 of the two substrates are coated with at least a liquid photoresist to form photoresist layers 41, 42 and photoetching is carried out. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003167353(A) 申请公布日期 2003.06.13
申请号 JP20010369688 申请日期 2001.12.04
申请人 TOPPAN PRINTING CO LTD 发明人 TANAKA SATOSHI;UEDA RYUJI;TAKAGI NOBUO
分类号 G03F7/16;C23F1/00;H05K9/00 主分类号 G03F7/16
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