发明名称 |
SYSTEM AND METHOD FOR LASER MICRO- MACHINING |
摘要 |
<p>System and method for laser micro−machining of crystalline and polycrystalline materials such as silicon that produces smooth surfaces.The invention is applied to integrated circuit applications including probing(1/20)or modification of circuit components,electrical connections through silicon substrates,establishing ground plain within integrated circuits,and connections between circuits developed on opposing sides of a single substrate methods involve the use of femtosecond light pulses of short wavelength and circular polarization.A specific fluence region is used to obtain machined surfaces with smoothness to within one micron.</p> |
申请公布号 |
WO03049155(A1) |
申请公布日期 |
2003.06.12 |
申请号 |
WO2002US38266 |
申请日期 |
2002.11.29 |
申请人 |
POSITIVE LIGHT, INC. |
发明人 |
TULLOCH, WILLIAM;FRY, ALAN;WESTON, JEREMY;WHITE, WILLIAM |
分类号 |
B23K26/00;B23K26/06;B23K26/38;B23K26/40;G01R1/067;G01R3/00;H01L21/768;H01L23/48;(IPC1-7):H01L21/00 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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