发明名称 PLASMA PROCESSING DEVICE
摘要 A plasma processing device, wherein magnetic segments (22) are installed on an annularly formed rotary body (30), an annular gear (32) for self−rotating is installed adjacent to and coaxially with the rotary body (30), when the rotary body (30) and the gear (32) for self−rotating are rotated relative to each other, pinion gears (35) and gears (34) are rotated by gear teeth (32b) provided along the inner peripheral part of the gear (32) for self−rotating to self−rotating the magnetic segments (22) relative to the rotary body (30) and, when the rotary body (30) and the gear (32) for self−rotating are rotated in synchronism with each other, the magnetic segments (22) are not rotated relative to the rotary body (30) and rotated around a process chamber so as to be revolved together with the rotary body (30), whereby the proper status of magnetic field can be easily controlled and set according to the type of a plasma processing process, and an excellent processing can be easily performed.
申请公布号 WO03049170(A1) 申请公布日期 2003.06.12
申请号 WO2002JP12736 申请日期 2002.12.05
申请人 TOKYO ELECTRON LIMITED;HAYASHI, DAISUKE;ONO, HIROO;HAYAMI, TOSHIHIRO 发明人 HAYASHI, DAISUKE;ONO, HIROO;HAYAMI, TOSHIHIRO
分类号 H01J37/32;(IPC1-7):H01L21/306 主分类号 H01J37/32
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